Reading The Pressure Setting From An X-Ray Image; Possible Shunt Components - miethke GAV Gebrauchsanweisung

GAV
READING THE PRESSURE SETTING FROM
AN X-RAY IMAGE
Each GAV is calibrated under strict quality con-
trol. The following pressure combinations are
available:
Opening pressure
horizontal vertical
5 cmH O 30 cmH O
2 2
5 cmH O 35 cmH O
2 2
5 cmH O 40 cmH O
2 2
O 30 cmH O
10 cmH
2 2
10 cmH O 40 cmH O
2 2
10 cmH O 50 cmH O
2 2
The pressure settings given above represent
the pressure drop in the valve at a drainage rate
of 5 ml/h.
The pressure settings selected can be checked
postoperatively on x-ray images, on which the
corresponding coding is visible.
Fig. 5: X-ray image (10/40 cmH
Coding
O)
2
INSTRUCTIONS FOR USE |

POSSIBLE SHUNT COMPONENTS

The GAV is available with different shunt ac-
cessories. These variants consist of a variety
of components, which are described briefly
below:
The borehole reservoir is positioned in the
cranial borehole. It allows measuring the in-
traventricular pressure, injecting drugs and
extracting CSF. Its solid titanium base is highly
puncture-resistant. All reservoirs are availa-
ble with integrated catheters or connectors.
A special borehole reservoir is the SPRUNG
RESERVOIR. As additional new feature of this
reservoir CSF can be flushed towards the val-
ve because of a one-way valve in the bottom
of the reservoir. By this mechanism a flow
in the direction of the ventricular catheter is
avoided during the pumping procedure. The
opening pressure of the shunt system is not
increased by the implantation of the SPRUNG
RESERVOIR.
The prechamber is positioned on the craniu m.
It allows measuring the intraventricular pressu-
re, injecting drugs, extracting CSF and perfor-
ming a palpatory ventricle inspection. Its solid
titanium base is highly puncture-resistant.
A puncture of the prechamber or the CONTROL
RESERVOIR should be performed as perpendi-
cular to the reservoir surface as possible with
a cannula of max. 0,9 mm. 30 times of punc-
tures are able without any restrictions. A special
prechamber is the CONTROL RESERVOIR. As
an additional new feature of this reservoir, CSF
can be flushed towards the valve because of a
one-way valve in the proximal inlet of the reser-
voir. By this mechanism a flow in the direction
of the ventricular catheter is avoided during the
pumping procedure. The opening pressure of
the shunt system is not increased by the im-
plantation of the CONTROL RESERVOIR.
Warning note: Frequent pumping can lead
to overdrainage and thus to unphysiological
pressure conditions. The patient should be
informed about the risk.
Due to its tight fit on the ventricular catheter, the
deflector allows choosing the length of catheter
penetrating into the skull prior to implantation.
The ventricular catheter is deflected at a right
angle in the borehole
GB
17